8" 探針台
Specification:1.8” Wafer stainless vacuum chuck(Hot Ch
Specification:
1.8” Wafer stainless vacuum chuck(Hot Chuck Upgrade)
2.Vacuum on-off switch to control each vacuum ring
3.Chuck X-Y stage distance 8”x8”
4.Chuck theta rotation 0°～360° manual
5.Platen up-down 25mm
6.Platen quick up-down
7.Fast pull-out Y stage for easy loading/unloading sample
8.Microscopemount 萬向軸承自由移動(跨視野量測)
9.box底座(660mm長x570mm寬x80mm高)
10.Heavy and stable bench base
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埋入式氣壓缸NSA10X15-N使用壓力0.15~0.7Mpa,耐壓1.03Mpa使用溫度:0~60