CF4

Germane / Germaniun Hydride

Application
Germane gas is a source of hyper-pure germanium in the chemical vapor deposition and molecular beam epitaxy of amorphous germanium layers, silicon-germanium (SiGe) and borongermanium alloys. Germane is used for high performance complementary metal oxide semiconductors and SiGe technologies associated with heterojunction bipolar transistors for high speed digital communications such as broad band and cell phones. Other applications include photon detectors, solar cells, quantum dots and LEDS.


Product Specification
Purity:    99.999%
H2              30
N2               1
O2+Ar        0.2
CH4           0.5
CO2           0.5
CO             0.5
Ge2H6       20
Ge3H8        1
Cl-Ge          1
H2O           0.5
*ppm